{
  "annotation_id": "f13b1b1c-d6cd-48d0-bfe7-7ec5e22db046",
  "date_created": "2026-03-02T18:02:27.614000Z",
  "date_modified": "2026-03-02T18:02:27.614000Z",
  "file_hash": "30a3739db8f3813a6eefe4d7e38f2c04a521ba5d472e519e7635a34674bbf84e",
  "private": false,
  "record": {
    "abstract": "We study the optimal focusing of two-level atoms with a near resonant\nstanding wave light, using both classical and quantum treatments of the\nproblem. Operation of the focusing setup is considered as a nonlinear spatial\nsqueezing of atoms in the thin- and thick-lens regimes. It is found that the\nnear-resonant standing wave focuses the atoms with a reduced background in\ncomparison with far-detuned light fields. For some parameters, the quantum\natomic distribution shows even better localization than the classical one.\nSpontaneous emission effects are included via the technique of quantum Monte\nCarlo wave function simulations. We investigate the extent to which\nnon-adiabatic and spontaneous emission effects limit the achievable minimal\nsize of the deposited structures.",
    "arxiv_id": "quant-ph/0606145",
    "authors": [
      "R. Arun",
      "Offir Cohen",
      "I. Sh. Averbukh"
    ],
    "categories": [
      "quant-ph"
    ],
    "doi": "10.1103/PhysRevA.81.063809",
    "title": "Atom Lithography with Near-Resonant Light Masks: Quantum Optimization   Analysis",
    "url": "https://arxiv.org/abs/quant-ph/0606145"
  },
  "schema_id": "dorsal/arxiv",
  "source": {
    "execution_id": "e1c780aa-e137-457f-bc24-de7eccd15185",
    "id": "arXiv Dataset IDs",
    "type": "Model",
    "variant": "snapshot-2026-03-01",
    "version": "0.1.0"
  },
  "user_id": 1000002
}