{
  "annotation_id": "ec35b698-5111-42f8-b9a6-20294f527852",
  "date_created": "2026-03-02T18:02:17.090000Z",
  "date_modified": "2026-03-02T18:02:17.090000Z",
  "file_hash": "26b19b829aa933078bcbccb2120fe70ed096d71bca74adf0abb5cf3756a320f3",
  "private": false,
  "record": {
    "abstract": "We study the focusing of atoms by multiple layers of standing light waves in\nthe context of atom lithography. In particular, atomic localization by a\ndouble-layer light mask is examined using the optimal squeezing approach.\nOperation of the focusing setup is analyzed both in the paraxial approximation\nand in the regime of nonlinear spatial squeezing for the thin-thin as well as\nthin-thick atom lens combinations. It is shown that the optimized double light\nmask may considerably reduce the imaging problems, improve the quality of\nfocusing and enhance the contrast ratio of the deposited structures.",
    "arxiv_id": "quant-ph/0503181",
    "authors": [
      "R. Arun",
      "I. Sh. Averbukh",
      "T. Pfau"
    ],
    "categories": [
      "quant-ph"
    ],
    "doi": "10.1103/PhysRevA.72.023417",
    "journal_ref": "Phys. Rev. A 72, 023417 (2005).",
    "title": "Atom Nano-lithography with Multi-layer Light Masks: Particle Optics   Analysis",
    "url": "https://arxiv.org/abs/quant-ph/0503181"
  },
  "schema_id": "dorsal/arxiv",
  "source": {
    "execution_id": "1a99110b-8887-4749-99f7-aa75a8abf34c",
    "id": "arXiv Dataset IDs",
    "type": "Model",
    "variant": "snapshot-2026-03-01",
    "version": "0.1.0"
  },
  "user_id": 1000002
}