dorsal/arxiv
View SchemaQuantum Interferometric Optical Lithography: Exploiting Entanglement to Beat The Diffraction Limit
| Authors | Agedi N. Boto, Pieter Kok, Daniel S. Abrams, Samuel L. Braunstein, Colin P. Williams, Jonathan P. Dowling |
|---|---|
| Categories | |
| ArXiv ID | quant-ph/9912052 |
| URL | https://arxiv.org/abs/quant-ph/9912052 |
| DOI | 10.1103/PhysRevLett.85.2733 |
| Journal | Phys. Rev. Lett. 85, 2733 (2000) |
Abstract
Classical, interferometric, optical lithography is diffraction limited to writing features of a size lambda/2 or greater, where lambda is the optical wavelength. Using nonclassical photon number states, entangled N at a time, we show that it is possible to write features of minimum size lambda/(2N) in an N-photon absorbing substrate. This result surpasses the usual classical diffraction limit by a factor of N. Since the number of features that can be etched on a two-dimensional surface scales inversely as the square of the feature size, this allows one to write a factor of N^2 more elements on a semiconductor chip. A factor of N = 2 can be achieved easily with entangled photon pairs generated from optical parametric downconversion. It is shown how to write arbitrary 2D patterns by using this method.
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"abstract": "Classical, interferometric, optical lithography is diffraction limited to\nwriting features of a size lambda/2 or greater, where lambda is the optical\nwavelength. Using nonclassical photon number states, entangled N at a time, we\nshow that it is possible to write features of minimum size lambda/(2N) in an\nN-photon absorbing substrate. This result surpasses the usual classical\ndiffraction limit by a factor of N. Since the number of features that can be\netched on a two-dimensional surface scales inversely as the square of the\nfeature size, this allows one to write a factor of N^2 more elements on a\nsemiconductor chip. A factor of N = 2 can be achieved easily with entangled\nphoton pairs generated from optical parametric downconversion. It is shown how\nto write arbitrary 2D patterns by using this method.",
"arxiv_id": "quant-ph/9912052",
"authors": [
"Agedi N. Boto",
"Pieter Kok",
"Daniel S. Abrams",
"Samuel L. Braunstein",
"Colin P. Williams",
"Jonathan P. Dowling"
],
"categories": [
"quant-ph"
],
"doi": "10.1103/PhysRevLett.85.2733",
"journal_ref": "Phys. Rev. Lett. 85, 2733 (2000)",
"title": "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat The Diffraction Limit",
"url": "https://arxiv.org/abs/quant-ph/9912052"
},
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