dorsal/arxiv
View SchemaTwo-dimensional atomic lithography by sub-micron focusing of atomic beams
| Authors | W. Williams, M. Saffman |
|---|---|
| Categories | |
| ArXiv ID | physics/0506022 |
| URL | https://arxiv.org/abs/physics/0506022 |
| DOI | 10.1364/JOSAB.23.001161 |
| Journal | J. Opt. Soc. Am. B 23, 1161 (2006) |
Abstract
We analyze a method for serial writing of arbitrary two-dimensional patterns using optical focusing of a collimated atomic beam. A spatial light modulator is used in a side illumination geometry to create a localized optical spot with secondary maxima that are well separated from the central peak. Numerical simulation of a lithography experiment using a magneto-optical trap as a source of cold Cs atoms, collimation and cooling in a magnetic guide, and optical focusing predicts full width at half maximum pixel sizes of 110 x 110 nm and writing times of about $20 \rm ms$ per pixel.
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"abstract": "We analyze a method for serial writing of arbitrary two-dimensional patterns\nusing optical focusing of a collimated atomic beam. A spatial light modulator\nis used in a side illumination geometry to create a localized optical spot with\nsecondary maxima that are well separated from the central peak. Numerical\nsimulation of a lithography experiment using a magneto-optical trap as a source\nof cold Cs atoms, collimation and cooling in a magnetic guide, and optical\nfocusing predicts full width at half maximum pixel sizes of 110 x 110 nm and\nwriting times of about $20 \\rm ms$ per pixel.",
"arxiv_id": "physics/0506022",
"authors": [
"W. Williams",
"M. Saffman"
],
"categories": [
"physics.atom-ph"
],
"doi": "10.1364/JOSAB.23.001161",
"journal_ref": "J. Opt. Soc. Am. B 23, 1161 (2006)",
"title": "Two-dimensional atomic lithography by sub-micron focusing of atomic beams",
"url": "https://arxiv.org/abs/physics/0506022"
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