{
  "annotation_id": "d17d3ffb-e5c4-454b-ab88-eaa8c30c5460",
  "date_created": "2026-03-02T18:01:14.873000Z",
  "date_modified": "2026-03-02T18:01:14.873000Z",
  "file_hash": "d484179f2bee4d13ea0a73473c03b26893887757ad453a1f5bac91344d2420ee",
  "private": false,
  "record": {
    "abstract": "Generally, the conditions for deep sub-Doppler laser cooling do not match the\nconditions for the strong atomic localization that takes a place in deeper\noptical potential and, in consequence, leads to larger temperature. Moreover,\nfor a given detuning in a deep optical potential the secular approximation\nwhich is usually used for quantum description of laser cooling becomes no more\nvalid. Here we perform an analysis of atomic localization in optical potential\nbased on a full quantum approach for atomic density matrix. We also show that\nthe laser cooling in a deep far-off detuned optical potential, created by a\nlight field with a polarization gradient, can be used as an alternative method\nfor forming high contrast spatially localized structures of atoms for the\npurposes of atom lithography and atomic nanofabrication. Finally, we perform an\nanalysis of the possible limits for the width and the contrast of localized\natomic structures that can in principle be reached by this type of the light\nmask.",
    "arxiv_id": "physics/0610123",
    "authors": [
      "O. N. Prudnikov",
      "A. V. Taichenachev",
      "A. M. Tumaikin",
      "V. I. Yudin"
    ],
    "categories": [
      "physics.atom-ph"
    ],
    "doi": "10.1103/PhysRevA.75.023413",
    "journal_ref": "Phys. Rev. A 75, 023413 (2007)",
    "title": "Dissipative light field as a way to create strongly localized structures   for atom lithography",
    "url": "https://arxiv.org/abs/physics/0610123"
  },
  "schema_id": "dorsal/arxiv",
  "source": {
    "execution_id": "f8e0ad33-d201-45f4-81cd-673ce7304b78",
    "id": "arXiv Dataset IDs",
    "type": "Model",
    "variant": "snapshot-2026-03-01",
    "version": "0.1.0"
  },
  "user_id": 1000002
}