{
  "annotation_id": "b2349a2a-5263-44ae-aae8-7ed8e7754298",
  "date_created": "2026-03-02T18:00:45.960000Z",
  "date_modified": "2026-03-02T18:00:45.960000Z",
  "file_hash": "ac31cfd979191202d8ebeecec82cfb504706cf8cb3dcb6fd3627cf49ca42a7ab",
  "private": false,
  "record": {
    "abstract": "A photogrammetric method of stress analysis has been developed to test thin,\nnonstandard windows designed for hydrogen absorbers, major components of a muon\ncooling channel. The purpose of the absorber window tests is to demonstrate an\nunderstanding of the window behavior and strength as a function of applied\npressure. This is done by comparing the deformation of the window, measured via\nphotogrammetry, to the deformation predicted by finite element analysis (FEA).\nFEA analyses indicate a strong sensitivity of strain to the window thickness.\nPhotogrammetric methods were chosen to measure the thickness of the window,\nthus providing data that are more accurate to the FEA. This, plus improvements\nmade in hardware and testing procedures, resulted in a precision of 5 microns\nin all dimensions and substantial agreement with FEA predictions.",
    "arxiv_id": "physics/0311008",
    "authors": [
      "Donna L. Kubik",
      "John A. Greenwood"
    ],
    "categories": [
      "physics.ins-det"
    ],
    "journal_ref": "ECONFC0211115:061,2002",
    "title": "Development of Photogrammetric Methods of Stress Analysis and Quality   Control",
    "url": "https://arxiv.org/abs/physics/0311008"
  },
  "schema_id": "dorsal/arxiv",
  "source": {
    "execution_id": "60a65295-0cc7-4ab7-956d-ff2d4a82102d",
    "id": "arXiv Dataset IDs",
    "type": "Model",
    "variant": "snapshot-2026-03-01",
    "version": "0.1.0"
  },
  "user_id": 1000002
}