dorsal/arxiv
View SchemaTwo-photon diffraction and quantum lithography
| Authors | Milena D'Angelo, Maria V. Chekhova, Yanhua H. Shih |
|---|---|
| Categories | |
| ArXiv ID | quant-ph/0103035 |
| URL | https://arxiv.org/abs/quant-ph/0103035 |
| DOI | 10.1103/PhysRevLett.87.013602 |
Abstract
We report a proof-of-principle experimental demonstration of quantum lithography. Utilizing the entangled nature of a two-photon state, the experimental results have bettered the classical diffraction limit by a factor of two. This is a quantum mechanical two-photon phenomenon but not a violation of the uncertainty principle.
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"abstract": "We report a proof-of-principle experimental demonstration of quantum\nlithography. Utilizing the entangled nature of a two-photon state, the\nexperimental results have bettered the classical diffraction limit by a factor\nof two. This is a quantum mechanical two-photon phenomenon but not a violation\nof the uncertainty principle.",
"arxiv_id": "quant-ph/0103035",
"authors": [
"Milena D\u0027Angelo",
"Maria V. Chekhova",
"Yanhua H. Shih"
],
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"quant-ph"
],
"doi": "10.1103/PhysRevLett.87.013602",
"title": "Two-photon diffraction and quantum lithography",
"url": "https://arxiv.org/abs/quant-ph/0103035"
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