dorsal/arxiv
View SchemaElectric microfield distribution in two-component plasmas. Theory and Simulations
| Authors | J. Ortner, I. Valuev, W. Ebeling |
|---|---|
| Categories | |
| ArXiv ID | physics/9912019 |
| URL | https://arxiv.org/abs/physics/9912019 |
| DOI | 10.1002/1521-3986(200009)40:5/6<555::AID-CTPP555>3.3.CO;2-X |
Abstract
The distribution of the electric microfield at a charged particle moving in a two-component plasma is calculated. The theoretical approximations are obtained via the parameter integration technique and using the screened pair approximation for the generalized radial distribution function. It is shown that the two-component plasma microfield distribution shows a larger probability of high microfield values than the corresponding distribution of the commonly used OCP model. The theory is checked by quasiclassical molecular-dynamics simulations. For the simulations a corrected Kelbg pseudopotential has been used.
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"date_created": "2026-03-02T18:01:25.024000Z",
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"abstract": "The distribution of the electric microfield at a charged particle moving in a\ntwo-component plasma is calculated. The theoretical approximations are obtained\nvia the parameter integration technique and using the screened pair\napproximation for the generalized radial distribution function. It is shown\nthat the two-component plasma microfield distribution shows a larger\nprobability of high microfield values than the corresponding distribution of\nthe commonly used OCP model. The theory is checked by quasiclassical\nmolecular-dynamics simulations. For the simulations a corrected Kelbg\npseudopotential has been used.",
"arxiv_id": "physics/9912019",
"authors": [
"J. Ortner",
"I. Valuev",
"W. Ebeling"
],
"categories": [
"physics.plasm-ph"
],
"doi": "10.1002/1521-3986(200009)40:5/6\u003c555::AID-CTPP555\u003e3.3.CO;2-X",
"title": "Electric microfield distribution in two-component plasmas. Theory and Simulations",
"url": "https://arxiv.org/abs/physics/9912019"
},
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