{
  "annotation_id": "8a16234d-6c2a-4f44-b822-51a2f41659b8",
  "date_created": "2026-03-02T18:02:31.160000Z",
  "date_modified": "2026-03-02T18:02:31.160000Z",
  "file_hash": "167659fdf8cf2ef1679116673ffe92eeea67a7e0820e834e40d890079439d69c",
  "private": false,
  "record": {
    "abstract": "We present a theoretical analysis of the properties of an unseeded optical\nparametic amplifier (OPA) used as the source of entangled photons for\napplications in quantum lithography. We first study the dependence of the\nexcitation rate of a two-photon absorber on the intensity of the light leaving\nthe OPA. We find that the rate depends linearly on intensity only for output\nbeams so weak that they contain fewer than one photon per mode. We also study\nthe use of an N-photon absorber for arbitrary N as the recording medium to be\nused with such a light source. We find that the contrast of the interference\npattern and the sharpness of the fringe maxima tend to increase with increasing\nvalues of N, but that the density of fringes and thus the limiting resolution\ndoes not increase with N. We conclude that the output of an unseeded OPA\nexciting an N-photon absorber provides an attractive system in which to perform\nquantum lithography.",
    "arxiv_id": "quant-ph/0608170",
    "authors": [
      "Girish S. Agarwal",
      "Kam Wai Chan",
      "Robert W. Boyd",
      "Hugo Cable",
      "Jonathan P. Dowling"
    ],
    "categories": [
      "quant-ph"
    ],
    "doi": "10.1364/JOSAB.24.000270",
    "journal_ref": "J. Opt. Soc. Am. B 24, 270 (2007)",
    "title": "Quantum States of Light Produced by a High-Gain Optical Parametric   Amplifier for Use in Quantum Lithography",
    "url": "https://arxiv.org/abs/quant-ph/0608170"
  },
  "schema_id": "dorsal/arxiv",
  "source": {
    "execution_id": "55292464-5079-4444-b5e9-be3d101b67e0",
    "id": "arXiv Dataset IDs",
    "type": "Model",
    "variant": "snapshot-2026-03-01",
    "version": "0.1.0"
  },
  "user_id": 1000002
}