{
  "annotation_id": "849b9d4b-692b-4683-b859-da77ba135146",
  "date_created": "2026-03-02T18:01:42.309000Z",
  "date_modified": "2026-03-02T18:01:42.309000Z",
  "file_hash": "119ae7a67f0b0f99ebbc2178951eb0a6385754f0ab4808e0743ec70725ee676b",
  "private": false,
  "record": {
    "abstract": "We demonstrate a systematic approach to sub-wavelength resolution\nlithographic image formation on films covering areas larger than a wavelength\nsquared. For example, it is possible to make a lithographic pattern with a\nfeature size resolution of $\\lambda/[2(N+1)]$ by using a particular $2\nM$-photon, multi-mode entangled state, where $N \u003c M$, and banks of birefringent\nplates. By preparing a statistically mixed such a state one can form any pixel\npattern on a $(N+1) 2^{M-N} \\times (N+1) 2^{M-N}$ pixel grid occupying a square\nwith a side of $L=2^{M-N-1}$ wavelengths. Hence, there is a trade-off between\nthe exposed area, the minimum lithographic feature size resolution, and the\nnumber of photons used for the exposure. We also show that the proposed method\nwill work even under non-ideal conditions, albeit with somewhat poorer\nperformance.",
    "arxiv_id": "quant-ph/0101122",
    "authors": [
      "Gunnar Bjork",
      "Luis L. Sanchez Soto",
      "Jonas Soderholm"
    ],
    "categories": [
      "quant-ph"
    ],
    "doi": "10.1103/PhysRevA.64.013811",
    "journal_ref": "Phys.Rev. A64 (2001) 013811",
    "title": "Sub-wavelength lithography over extended areas",
    "url": "https://arxiv.org/abs/quant-ph/0101122"
  },
  "schema_id": "dorsal/arxiv",
  "source": {
    "execution_id": "c9244bb5-e3cb-4017-b5f3-58f865411db4",
    "id": "arXiv Dataset IDs",
    "type": "Model",
    "variant": "snapshot-2026-03-01",
    "version": "0.1.0"
  },
  "user_id": 1000002
}