dorsal/arxiv
View SchemaA microfabricated surface-electrode ion trap in silicon
| Authors | J. Britton, D. Leibfried, J. Beall, R. B. Blakestad, J. J. Bollinger, J. Chiaverini, R. J. Epstein, J. D. Jost, D. Kielpinski, C. Langer, R. Ozeri, R. Reichle, S. Seidelin, N. Shiga, J. H. Wesenberg, D. J. Wineland |
|---|---|
| Categories | |
| ArXiv ID | quant-ph/0605170 |
| URL | https://arxiv.org/abs/quant-ph/0605170 |
Abstract
The prospect of building a quantum information processor underlies many recent advances ion trap fabrication techniques. Potentially, a quantum computer could be constructed from a large array of interconnected ion traps. We report on a micrometer-scale ion trap, fabricated from bulk silicon using micro-electromechanical systems (MEMS) techniques. The trap geometry is relatively simple in that the electrodes lie in a single plane beneath the ions. In such a trap we confine laser-cooled 24Mg+ ions approximately 40 microns above the surface. The fabrication technique and planar electrode geometry together make this approach amenable to scaling up to large trap arrays. In addition we observe that little laser cooling light is scattered by the electrodes.
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"date_created": "2026-03-02T18:02:27.655000Z",
"date_modified": "2026-03-02T18:02:27.655000Z",
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"abstract": "The prospect of building a quantum information processor underlies many\nrecent advances ion trap fabrication techniques. Potentially, a quantum\ncomputer could be constructed from a large array of interconnected ion traps.\nWe report on a micrometer-scale ion trap, fabricated from bulk silicon using\nmicro-electromechanical systems (MEMS) techniques. The trap geometry is\nrelatively simple in that the electrodes lie in a single plane beneath the\nions. In such a trap we confine laser-cooled 24Mg+ ions approximately 40\nmicrons above the surface. The fabrication technique and planar electrode\ngeometry together make this approach amenable to scaling up to large trap\narrays. In addition we observe that little laser cooling light is scattered by\nthe electrodes.",
"arxiv_id": "quant-ph/0605170",
"authors": [
"J. Britton",
"D. Leibfried",
"J. Beall",
"R. B. Blakestad",
"J. J. Bollinger",
"J. Chiaverini",
"R. J. Epstein",
"J. D. Jost",
"D. Kielpinski",
"C. Langer",
"R. Ozeri",
"R. Reichle",
"S. Seidelin",
"N. Shiga",
"J. H. Wesenberg",
"D. J. Wineland"
],
"categories": [
"quant-ph"
],
"title": "A microfabricated surface-electrode ion trap in silicon",
"url": "https://arxiv.org/abs/quant-ph/0605170"
},
"schema_id": "dorsal/arxiv",
"source": {
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"id": "arXiv Dataset IDs",
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"variant": "snapshot-2026-03-01",
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