{
  "annotation_id": "5f403df7-6315-4a19-98c0-554d848201d5",
  "date_created": "2026-03-02T18:00:39.764000Z",
  "date_modified": "2026-03-02T18:00:39.764000Z",
  "file_hash": "7a79f1fdbb1b49f1810d68c5593ab83cb16b6ab570707959a870b69bdb9d2c5a",
  "private": false,
  "record": {
    "abstract": "We demonstrate the use of frequency-encoded light masks in neutral atom\nlithography. We demonstrate that multiple features can be patterned across a\nmonotonic potential gradient. Features as narrow as 0.9 microns are fabricated\non silicon substrates with a metastable argon beam. Internal state manipulation\nwith such a mask enables continuously adjustable feature positions and feature\ndensities not limited by the optical wavelength, unlike previous light masks.",
    "arxiv_id": "physics/0209084",
    "authors": [
      "J. H. Thywissen",
      "M. Prentiss"
    ],
    "categories": [
      "physics.atom-ph"
    ],
    "doi": "10.1088/1367-2630/7/1/047",
    "journal_ref": "New J. Phys. 7, 47 (2005)",
    "title": "Atom lithography using MRI-type feature placement",
    "url": "https://arxiv.org/abs/physics/0209084"
  },
  "schema_id": "dorsal/arxiv",
  "source": {
    "execution_id": "a48d023c-6542-4958-8970-9302aeabf362",
    "id": "arXiv Dataset IDs",
    "type": "Model",
    "variant": "snapshot-2026-03-01",
    "version": "0.1.0"
  },
  "user_id": 1000002
}