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Added by Arxiv Bot | Added: 2026-03-02 18:01 | Views: 1 | Source: arXiv Dataset IDs (Model)

Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit"

Authors	Ole Steuernagel
Categories	quant-ph
ArXiv ID	quant-ph/0305042
URL	https://arxiv.org/abs/quant-ph/0305042

Abstract

Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit" The effective absorption rates in quantum lithography are very low.

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    "abstract": "Comment on \"Quantum Interferometric Optical Lithography: Exploiting\nEntanglement to Beat the Diffraction Limit\"\n  The effective absorption rates in quantum lithography are very low.",
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    "title": "Comment on \"Quantum Interferometric Optical Lithography: Exploiting   Entanglement to Beat the Diffraction Limit\"",
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