dorsal/arxiv
View SchemaEntangled-State Lithography: Tailoring any Pattern with a Single State
| Authors | Gunnar Bjork, Luis L. Sanchez-Soto, Jonas Soderholm |
|---|---|
| Categories | |
| ArXiv ID | quant-ph/0011075 |
| URL | https://arxiv.org/abs/quant-ph/0011075 |
| DOI | 10.1103/PhysRevLett.86.4516 |
| Journal | Phys.Rev.Lett. 86 (2001) 4516-4519 |
Abstract
We demonstrate a systematic approach to Heisenberg-limited lithographic image formation using four-mode reciprocal binominal states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a $(N+1) \times (N+1)$ grid, occupying a square with the side half a wavelength long, can be generated from a $2 N$-photon state.
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"abstract": "We demonstrate a systematic approach to Heisenberg-limited lithographic image\nformation using four-mode reciprocal binominal states. By controlling the\nexposure pattern with a simple bank of birefringent plates, any pixel pattern\non a $(N+1) \\times (N+1)$ grid, occupying a square with the side half a\nwavelength long, can be generated from a $2 N$-photon state.",
"arxiv_id": "quant-ph/0011075",
"authors": [
"Gunnar Bjork",
"Luis L. Sanchez-Soto",
"Jonas Soderholm"
],
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"quant-ph"
],
"doi": "10.1103/PhysRevLett.86.4516",
"journal_ref": "Phys.Rev.Lett. 86 (2001) 4516-4519",
"title": "Entangled-State Lithography: Tailoring any Pattern with a Single State",
"url": "https://arxiv.org/abs/quant-ph/0011075"
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