{
  "annotation_id": "375c8afc-c9da-4309-ac16-91e66b3a2a6f",
  "date_created": "2026-03-02T18:02:06.451000Z",
  "date_modified": "2026-03-02T18:02:06.451000Z",
  "file_hash": "b24bc4dcee7f2c566f504b4d7872b1f859af890b2cd53c4791e50df36becf2d1",
  "private": false,
  "record": {
    "abstract": "Many previous works on quantum photolithography are based on\nmaximally-entangled states (MES). In this paper, we generalize the MES quantum\nphotolithography to the case where two light beams share a $N$-photon\nnonmaximally-entangled state. we investigate the correlations between quantum\nentanglement and quantum photolithography. It is shown that for nonlocal\nentanglement between the two light beams the amplitude of the deposition rate\ncan be changed through varying the degree of entanglement described by an\nentanglement angle while the resolution remains unchanged, and found that for\nlocal entanglement between the two light beams the effective Rayleigh\nresolution of quantum photolithography can be resonantly enhanced.",
    "arxiv_id": "quant-ph/0402059",
    "authors": [
      "Yan-Hui Wang",
      "Le-Man Kuang"
    ],
    "categories": [
      "quant-ph"
    ],
    "doi": "10.1088/1464-4266/5/5/005",
    "journal_ref": "J. Opt. B: Quantum Semiclass. Opt. 5 (2003) 405-408",
    "title": "Nonmaximally-entangled-state quantum photolithography",
    "url": "https://arxiv.org/abs/quant-ph/0402059"
  },
  "schema_id": "dorsal/arxiv",
  "source": {
    "execution_id": "36e2d1b6-c193-461b-85e5-054fff8529c8",
    "id": "arXiv Dataset IDs",
    "type": "Model",
    "variant": "snapshot-2026-03-01",
    "version": "0.1.0"
  },
  "user_id": 1000002
}