{
  "annotation_id": "1ceaaf3e-fd70-4f19-abe5-394864764a02",
  "date_created": "2026-03-02T18:01:42.652000Z",
  "date_modified": "2026-03-02T18:01:42.652000Z",
  "file_hash": "54de6bf9c68a96d85032c3dadb796048bd033bc89fef12245e801811cc6721ee",
  "private": false,
  "record": {
    "abstract": "As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum\nlithography offers an increase in resolution below the diffraction limit. Here,\nwe generalize this procedure in order to create patterns in one and two\ndimensions. This renders quantum lithography a potentially useful tool in\nnanotechnology.",
    "arxiv_id": "quant-ph/0011088",
    "authors": [
      "Pieter Kok",
      "Agedi N. Boto",
      "Daniel S. Abrams",
      "Colin P. Williams",
      "Samuel L. Braunstein",
      "Jonathan P. Dowling"
    ],
    "categories": [
      "quant-ph"
    ],
    "doi": "10.1103/PhysRevA.63.063407",
    "journal_ref": "Phys. Rev. A 63, 063407 (2001)",
    "title": "Quantum interferometric optical lithography:towards arbitrary   two-dimensional patterns",
    "url": "https://arxiv.org/abs/quant-ph/0011088"
  },
  "schema_id": "dorsal/arxiv",
  "source": {
    "execution_id": "ac485bcf-de88-4e03-a1e5-7e593403fcc6",
    "id": "arXiv Dataset IDs",
    "type": "Model",
    "variant": "snapshot-2026-03-01",
    "version": "0.1.0"
  },
  "user_id": 1000002
}