dorsal/arxiv
View SchemaQuantum interferometric optical lithography:towards arbitrary two-dimensional patterns
| Authors | Pieter Kok, Agedi N. Boto, Daniel S. Abrams, Colin P. Williams, Samuel L. Braunstein, Jonathan P. Dowling |
|---|---|
| Categories | |
| ArXiv ID | quant-ph/0011088 |
| URL | https://arxiv.org/abs/quant-ph/0011088 |
| DOI | 10.1103/PhysRevA.63.063407 |
| Journal | Phys. Rev. A 63, 063407 (2001) |
Abstract
As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum lithography offers an increase in resolution below the diffraction limit. Here, we generalize this procedure in order to create patterns in one and two dimensions. This renders quantum lithography a potentially useful tool in nanotechnology.
{
"annotation_id": "1ceaaf3e-fd70-4f19-abe5-394864764a02",
"date_created": "2026-03-02T18:01:42.652000Z",
"date_modified": "2026-03-02T18:01:42.652000Z",
"file_hash": "54de6bf9c68a96d85032c3dadb796048bd033bc89fef12245e801811cc6721ee",
"private": false,
"record": {
"abstract": "As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum\nlithography offers an increase in resolution below the diffraction limit. Here,\nwe generalize this procedure in order to create patterns in one and two\ndimensions. This renders quantum lithography a potentially useful tool in\nnanotechnology.",
"arxiv_id": "quant-ph/0011088",
"authors": [
"Pieter Kok",
"Agedi N. Boto",
"Daniel S. Abrams",
"Colin P. Williams",
"Samuel L. Braunstein",
"Jonathan P. Dowling"
],
"categories": [
"quant-ph"
],
"doi": "10.1103/PhysRevA.63.063407",
"journal_ref": "Phys. Rev. A 63, 063407 (2001)",
"title": "Quantum interferometric optical lithography:towards arbitrary two-dimensional patterns",
"url": "https://arxiv.org/abs/quant-ph/0011088"
},
"schema_id": "dorsal/arxiv",
"source": {
"execution_id": "ac485bcf-de88-4e03-a1e5-7e593403fcc6",
"id": "arXiv Dataset IDs",
"type": "Model",
"variant": "snapshot-2026-03-01",
"version": "0.1.0"
},
"user_id": 1000002
}