dorsal/arxiv
View SchemaNanolithography with metastable helium atoms in a high-power standing-wave light field
| Authors | S. J. H. Petra, L. Feenstra, W. Hogervorst, W. Vassen |
|---|---|
| Categories | |
| ArXiv ID | physics/0308076 |
| URL | https://arxiv.org/abs/physics/0308076 |
| DOI | 10.1007/s00340-003-1371-8 |
| Journal | Appl. Phys. B 78 (2), 133-136 (2004) |
Abstract
We have created periodic nanoscale structures in a gold substrate with a lithography process using metastable triplet helium atoms that damage a hydrofobic resist layer on top of the substrate. A beam of metastable helium atoms is transversely cooled and guided through an intense standing-wave light field. Compared to commonly used low-power optical masks, a high-power light field (saturation parameter of 10E7) increases the confinement of the atoms in the standing-wave considerably, and makes the alignment of the experimental setup less critical. Due to the high internal energy of the metastable helium atoms (20 eV), a dose of only one atom per resist molecule is required. With an exposure time of only eight minutes, parallel lines with a separation of 542 nm and a width of 100 nm (1/11th of the wavelength used for the optical mask) are created.
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"abstract": "We have created periodic nanoscale structures in a gold substrate with a\nlithography process using metastable triplet helium atoms that damage a\nhydrofobic resist layer on top of the substrate. A beam of metastable helium\natoms is transversely cooled and guided through an intense standing-wave light\nfield. Compared to commonly used low-power optical masks, a high-power light\nfield (saturation parameter of 10E7) increases the confinement of the atoms in\nthe standing-wave considerably, and makes the alignment of the experimental\nsetup less critical. Due to the high internal energy of the metastable helium\natoms (20 eV), a dose of only one atom per resist molecule is required. With an\nexposure time of only eight minutes, parallel lines with a separation of 542 nm\nand a width of 100 nm (1/11th of the wavelength used for the optical mask) are\ncreated.",
"arxiv_id": "physics/0308076",
"authors": [
"S. J. H. Petra",
"L. Feenstra",
"W. Hogervorst",
"W. Vassen"
],
"categories": [
"physics.atom-ph"
],
"doi": "10.1007/s00340-003-1371-8",
"journal_ref": "Appl. Phys. B 78 (2), 133-136 (2004)",
"title": "Nanolithography with metastable helium atoms in a high-power standing-wave light field",
"url": "https://arxiv.org/abs/physics/0308076"
},
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