dorsal/arxiv
View SchemaSensor for monitoring plasma parameters
| Authors | Alexander A. Bol'shakov, Brett A. Cruden, Surendra P. Sharma |
|---|---|
| Categories | |
| ArXiv ID | physics/0608113 |
| URL | https://arxiv.org/abs/physics/0608113 |
| DOI | 10.1117/12.528991 |
| Journal | Proc. SPIE, v.5339 (Photon Processing in Microelectronics and Photonics III), paper 5339-59, pp. 415-426 (2004) |
Abstract
A spectrally tunable VCSEL (vertical cavity surface-emitting laser) was used as part of sensing hardware for measurements of the radial-integrated gas temperature inside an inductively coupled plasma reactor. The data were obtained by profiling the Doppler-broadened absorption of metastable Ar atoms at 763.51 nm in argon and argon/nitrogen plasmas (3, 45, and 90% N2 in Ar) at pressure 0.5-70 Pa and inductive power of 100 and 300 W. The results were compared to rotational temperature derived from the N2 emission at the (0,0) transition of the C - B system. The differences in integrated rotational and Doppler temperatures were attributed to non-uniform spatial distributions of both temperature and thermometric species (Ar* and N2*) that varied depending on conditions. A two-dimensional, two-temperature fluid plasma simulation was employed to explain these differences. This work should facilitate further development of a miniature sensor for non-intrusive acquisition of data (temperature and densities of multiple plasma species) during micro- and nano-fabrication plasma processing, thus enabling the diagnostic-assisted continuous optimization and advanced control over the processes. Such sensors would also enable tracking the origins and pathways of damaging contaminants, thereby providing real-time feedback for adjustment of processes. Our work serves as an example of how two line-of-sight integrated temperatures derived from different thermometric species make it possible to characterize the radial non-uniformity of the plasma.
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"abstract": "A spectrally tunable VCSEL (vertical cavity surface-emitting laser) was used\nas part of sensing hardware for measurements of the radial-integrated gas\ntemperature inside an inductively coupled plasma reactor. The data were\nobtained by profiling the Doppler-broadened absorption of metastable Ar atoms\nat 763.51 nm in argon and argon/nitrogen plasmas (3, 45, and 90% N2 in Ar) at\npressure 0.5-70 Pa and inductive power of 100 and 300 W. The results were\ncompared to rotational temperature derived from the N2 emission at the (0,0)\ntransition of the C - B system. The differences in integrated rotational and\nDoppler temperatures were attributed to non-uniform spatial distributions of\nboth temperature and thermometric species (Ar* and N2*) that varied depending\non conditions. A two-dimensional, two-temperature fluid plasma simulation was\nemployed to explain these differences. This work should facilitate further\ndevelopment of a miniature sensor for non-intrusive acquisition of data\n(temperature and densities of multiple plasma species) during micro- and\nnano-fabrication plasma processing, thus enabling the diagnostic-assisted\ncontinuous optimization and advanced control over the processes. Such sensors\nwould also enable tracking the origins and pathways of damaging contaminants,\nthereby providing real-time feedback for adjustment of processes. Our work\nserves as an example of how two line-of-sight integrated temperatures derived\nfrom different thermometric species make it possible to characterize the radial\nnon-uniformity of the plasma.",
"arxiv_id": "physics/0608113",
"authors": [
"Alexander A. Bol\u0027shakov",
"Brett A. Cruden",
"Surendra P. Sharma"
],
"categories": [
"physics.plasm-ph",
"physics.ins-det",
"physics.optics"
],
"doi": "10.1117/12.528991",
"journal_ref": "Proc. SPIE, v.5339 (Photon Processing in Microelectronics and\n Photonics III), paper 5339-59, pp. 415-426 (2004)",
"title": "Sensor for monitoring plasma parameters",
"url": "https://arxiv.org/abs/physics/0608113"
},
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